APPLICATIONS
Sisom has grown more than 50 different material films in single wafers, using LPSPEED, VPSPEED, and
GPSPEED, as shown in this table:
| Cu | Cd(1-x)ZnxS | AlxGaySz(PO4) |
| Sn | InSnO | LiSiO |
| ZnO (undoped and doped with Al, Ga, or In) | CdSnO | LiPO |
| ZnS | ZrB2 | LiAlTiPO |
| SnO | RuO | LiAlPO |
| In2O3 | Mn2O3 | LiAlGaSPO |
| Al2O3 | LiCoO2 | LiBPO |
| CuS | LiMn2O4 | LiAlSrSiO |
| SnS | LiNiO | LiZrNbO |
| In2S3 | LiMnNiCoAlO | TiO |
| CdS (undoped and doped with Al, or B) | LiNiCoAlO | LiSnO |
| Cdx-yAlyS | LiFePO | LiSnSiO |
| ZnxMgyCdzS | LiFeMnO | |
| CuInS2 | LiMnAlO | |
| Cu2SnS3 | LiCoAlO | |
| Cu2ZnSn(S,Se)4 | LiVO |
SPEED is applicable to
- Deposition of metal
- Deposition of glass
- Deposition of metal oxide
- Deposition of sulfide
- Deposition of other complex solid-state materials
- Deposition of composite materials
- Binary through hexanery compositions
- Water based solvents
Solid state materials and devices that are well suited for SISOM’s process, include:
- Photovoltaics
- LCD flex displays
- LEDs
- Lens coatings
- Electrolyte films
